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This domain name is claimed under the name of “. The website, or a website owned by a third party, is not licensed by Autodesk, Inc. The company, product and services names displayed on this website are the trademarks or registered trademarks of their.In the electronics industry, substrate interconnection may involve one or more wirebonds on a substrate, such as a die or IC chip, in order to connect the substrate to electrical components in a package or system. In some instances, a substrate may include one or more metal layers disposed thereon, such as copper, and the one or more metal layers may require a barrier in order to prevent migration of the copper through the metal layers into the substrate or other nearby material. Such barrier materials may be used to protect the metal layers from corrosion, oxidation, and the like.
A diffusion barrier can be formed of a material which is similar or dissimilar to the metal layer in order to prevent diffusion of the metal ions of the metal layer into a surrounding environment. If the substrate interconnection includes an aluminum layer, a diffusion barrier may consist of, for example, copper and or molybdenum, and is often referred to as a dual diffusion barrier (DUB). Alternatively, the substrate interconnection may include copper, and a diffusion barrier may include molybdenum and/or a combination of tantalum and nitrides. The choice of diffusion barrier depends on the composition of the material in the surrounding environment.
When a diffusion barrier must protect the metal layer from corrosion, oxidation, and the like, a diffusion barrier layer of appropriate thickness may be desired. If the diffusion barrier must protect the metal layer against migration of the metal ions, a diffusion barrier layer of appropriate thickness may also be desired. Thus, it is desirable to have the ability to control the thickness of a diffusion barrier layer. In addition, the diffusion barrier layer should be sufficiently thick to protect the metal layer from degradation and/or dissolution, and the resulting degradation and/or dissolution should not substantially adversely affect the performance of the electronic device.
As an example, U.S. Patent Application Publication No. 2002/0158291 by Liu, et al. describes a barrier layer that is used to protect a copper layer in a conductive trace, such as a copper circuit trace. Liu’s barrier layer includes a first copper containing layer of between about 30 to about 40 micro inches, a second copper containing layer of between about 20 to about 40 micro inches, and a barrier material http://fengshuiforlife.eu/wp-content/uploads/2022/06/ArtIcons_Pro.pdf
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